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  1. History and business approach. CG Compugraphic was founded in 1989, bringing the then innovative approach of combining software and graphics in order to create a new era of digital infotainment in Israel. The company initially focused on incorporating graphic computer systems in the video world. This combination was used in television projects ...

  2. A photomask is made by exposing, or writing, the designer’s pattern onto a resist-coated chrome mask blank. The latent image in the resist is developed to form the required pattern. This resist image acts as a mask during the etching process. The pattern is transferred into the chrome film when the resist layer is removed.

  3. www.facebook.com › groups › 11655772817Compugraphic - Facebook

    Alumni group for Compugraphic alumni.

  4. Locations. From world-class manufacturing facilities in Scotland, the USA and Germany, we provide photomask solutions for companies, universities and R&D Institutes around the globe. These sites are supported by a strategically located, world-class reticle repair and recertification facility in Austin, Texas. We have offices in Scotland ...

  5. Find company research, competitor information, contact details & financial data for Compugraphics U.S.A. Inc. of Waterbury, CT. Get the latest business insights from Dun & Bradstreet.

  6. We have a wealth of experience in Boolean operations and we can advise you about any Boolean operations you may need to ensure the highest performance of your mask. Master photomasks are the original products built by Compugraphics since 1970 and are still in use today. Order your photo-masks from us today. Compugraphics’ capabilities:

  7. Features. Reduces defects on wafers by providing an anti-stick layer, significantly minimizing the adhesion of resist onto the mask. Improves wafer process yield thereby reducing cost and cycle time. Prolongs the life of the photomask by reducing the need to clean the mask as often. Can be cleaned with common cleaning agents.

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