Yahoo Web Search

Search results

  1. Nanoelectronics. v. t. e. The "14 nanometer process" refers to a marketing term for the MOSFET technology node that is the successor to the "22 nm" (or "20 nm") node. The "14 nm" was so named by the International Technology Roadmap for Semiconductors (ITRS). Until about 2011, the node following "22 nm" was expected to be "16 nm".

  2. Summary. Intel has developed a true 14 nm technology with industry-leading performance, power, density and cost per transistor. The 14 nm technology and the lead processor product are now qualified and in volume production. A full menu of SoC transistor and interconnect features are provided.

    • 748KB
    • 53
  3. People also ask

  4. The 14 nm transistor fins are taller, thinner and more closely spaced for improved density and performance. These improved transistors also require fewer fins, which further improves the overall process density. The transistor gate pitch shrinks from 90 nm to 70 nm and the minimum interconnect pitch shrinks from 80 nm to 52 nm, enabling a logic ...

    • 601KB
    • 5
  5. Nov 5, 2018 · Since 22-nm technology node, FinFET has been utilized for several process nodes [ 15, 16, 17 ]. It is firstly introduced by Intel in 22-nm node and widely adopted by different companies in 16- or 14-nm process node. The process integration scheme of FinFET is compatible with that of the planar transistor.

    • Huaxiang Yin, Jiaxin Yao
    • 2018
  6. This paper describes the implementation of a high performance FinFET-based 14-nm CMOS Technology in Microwind. New concepts related to the design of FinFET and design for manufacturing are also described. The performances of a ring oscillator layout and a 6-transistor RAM memory layout are also analyzed. 1.

  7. Aug 31, 2021 · The 14 nm technology outsmarts the 12 nm as well as the 16 nm FinFET technology [7, 8]. 10 nm came into the picture nearly about in the year 2017 with a density of about 99.00 MTr/mm 2 for Intel, and as for TSMC, it is about 60 MTr/mm 2. The 10 nm FinFET technology is nearly about three times denser than the 14 nm process.

  8. Jan 31, 2018 · Abstract. A highly optimized silicon-on-insulator FinFET technology is utilized for the IBM processor designs in the 14-nm node. This process technology has a number of unique elements that enable ...

  1. People also search for