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Feb 22, 2021 · Thin films: definition, deposition techniques, and applications A thin film is a layer or layers (a stack of thin films is called a multilayer) of material ranging from nanometer (monolayer) to...
This five-volume handbook focuses on processing techniques, characterization methods, and physical properties of thin films (thin layers of insulating, conducting, or semiconductor material).
- Abstract
- 1. Introduction
- 2. Deposition methods
- 2.1 Physical deposition methods (PVD)
- 2.1.2 Sputtering
- 2.1.3 Laser ablation
- 2.2 Chemical deposition methods (CVD)
- 3. Thin films structure
- 4. Thin film morphology
- 5. Properties of thin films
- 5.1 Mechanical properties
- 5.2 Electrical properties
- 6.3 Microstructure and morphology
- 6.4 Electrical properties
- IB qN
- 8. Conclusions
Since its discovery in early times, thin films rapidly found industrial applications such as in decorative and optics purposes. With the evolution of thin film technol-ogy, supported by the development of vacuum technology and electric power facilities, the range of applications has increased at a level that nowadays almost every industrial sector...
This chapter covers the fundamentals of the thin film technology, including deposition techniques, structure and morphology, film properties, characterization techniques and applications. Due to the exceptional diversity of thin films and the large range of applications it is complicated to cover in detail all the areas, however, as many thin films...
Thin-films are in general developed to provide special properties, i.e. electrical, optical, mechanical, chemical, that satisfy the needs for specific applications. The desired properties are determined by the resulting film structure, which strongly dependents on the selected deposition method, film material, and substrate. In line with the wide r...
Physical deposition methods are usually referred as to physical vapor deposi-tion methods (PVD) because the process entails the generation of vapor. PVD essentially consists in removing growth species from a source or target material via evaporation, then this vapor is transported to the substrate surface, and eventually it solidifies in the surfac...
Sputtering essentially consists in the bombardment of the target material with energetic particles to dislodge atoms from its surface which travel through the plasma to eventually condensate onto the substrate. Three sputtering techniques are the most employed for thin film growth, including DC diode, RF-diode, and magnetron diode. In the DC diode ...
Laser ablation is based on a similar configuration as the previous techniques, i.e. usually an evacuated chamber with a target material to be evaporated, a sub-strate placed parallel to the target where the film condensates, and in this case, an additional high-power pulsed laser placed outside the deposition chamber which emits the energy for indu...
CVD is a deposition method where a volatile compound of a pre-established substance is introduced into a reactor, usually along with an inert gas, to induce a chemical reaction which produces a solid thin film onto a substrate at an elevated temperature. In this technique, unlike PVD, the reaction does not have to be pro-duced under vacuum conditio...
Different and complex chemical reaction occur during the deposition process depending on the technique employed and deposition parameters, such as substrate temperature, deposition rate, pressure, and alignment of vapor stream with sub-strate, which give rise to a variety of microstructures. The resulting microstructure in turn defines the physical...
Establishing the correlation between deposition parameters with the resulting morphology of deposited thin films is very complex because of the interaction of a number of factors, which influence the nucleation and growth phases. However, despite the wide spectrum for variability, it is possible to find some typical morpho-logical features that are...
In this section a brief description of the mechanical, electrical, and optical properties in connection with the morphological features will be provided.
Thin films, due to their versatility to provide tailored properties, have found application in a number of sectors going from simple coatings for wear and cor-rosion protection, to more advanced applications such as antireflective coatings, microelectronics, photovoltaics, etc. Although these material structures have been selected due to exclusivel...
Electrical properties within thin films comprise a broad field if one considers the different resulting microstructure, whether they are metallic films, semiconductors or insulators films, and the type of substrate on which they are deposited. However, much of these films possess some common morphological features that derive in sim-ilar transport ...
A number of methods are available for the microstructure characterization in terms of crystalline volume fraction, crystallite size, and crystallographic orientation. The distinctive microstructure and material phase of thin films as a result of deposition conditions can be extracted from Raman microscopy, and X-ray dif-fraction (XRD). The Raman te...
Perhaps the most widely used technique to measure the electrical resistivity is the four-point probe method. It consists of four metal tips linearly arranged keep-ing the same separation from each one where an electric current is applied in the outer two probes while the potential difference is measured in the inner two probes. From these measureme...
S where r is the scattering factor, and The carrier Hall mobility (μH) the resistivity previously calculated q is the elementary charge. is obtained by combining the Hall coefficient with μ
This chapter attempted to carry out the study of thin films maintaining a tight correlation among the deposition techniques, the resulting microstructure, and their physical properties. It was found that the development of deposition methods are driven to satisfy the needs for films with specific mechanical, physical and chemical properties. Overal...
Mar 30, 2019 · A thin film is simply a solid material but with the third (out-of-plane) dimension greatly reduced with respect to the first two (in-plane) dimensions. Perhaps an important question to address is; how thin is a thin film? In the fundamental research of perovskite...
- Jennifer Fowlie
- Jennifer.Fowlie@unige.ch
- 2019
Thin Film Technology: An Introduction. In order to appreciate thin film device applications, it is essential to understand what thin films are, what makes them so attractive for applica tions, and how they are prepared and characterized.
- Kasturi Lal Chopra, Inderjeet Kaur
- 1983
Jan 1, 2017 · Deposition of thin films by the main physical deposition methods of vacuum evaporation, molecular-beam epitaxy and sputtering are described in some detail, as are those by the chemical deposition methods of electrodeposition, chemical vapour deposition and the Langmuir–Blodgett technique.
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Thin Films. Thin films of various types are a key component of modern microelectronic and pho-tonic products. Conducting films form the interconnect layers in all chips, and dielectric films provide electrical insulation.