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3 days ago · Metal electrodes were fabricated using a DUV-lithography-based lift-off process that allowed us to manufacture electrodes with an alignment tolerance of less than 100 nm to the optical waveguide .
18 hours ago · The company has reiterated this strategy, especially emphasizing future 14A (1.4 nm-class) technology to consolidate its future leadership. Currently, Intel is on track to achieve its goal of “five process nodes in four years,” with Intel 7, Intel 4 (using EUV lithography), and Intel 3 already in mass production.
5 days ago · SMIC has been working on the development of 7nm technology for many years. One of the main challenges and key technology in fabricating at the latest nodes is lithography. As nodes get smaller and smaller, the need for EUV lithography gets more and more important. However, 7nm features can still be fabricated without EUV.
2 days ago · Nanoimprint lithography is a technology in metasurface production, akin to a stamp generating numerous replicas from a single mold. ... ketone, and acetone for metahologram realization, the ...
18 hours ago · Taiwan Semiconductor Manufacturing Company Limited ( TSMC; also called Taiwan Semiconductor) [4] [5] is a Taiwanese multinational semiconductor contract manufacturing and design company. It is the world's second-most valuable semiconductor company, [6] the world's largest dedicated independent ("pure-play") semiconductor foundry, [7] and its ...
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- US$73.67 billion (2022)
1 day ago · Nanoimprint lithography (NIL) is a rapid, high-resolution nanopatterning method that meets industrial requirements with its high throughput and low cost. Its capability for easy, large-area production of nanoscale structures makes it suitable for various applications, including nanotechnology, microsystems, electronics, optical devices, and ...
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