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  1. This discussion of mask works in BitLaw is divided into these six sections: Definition of a Mask Work. Requirements for Protection. National Origin Requirement. Registration of Mask Works. Rights Granted for Mask Works. Mask Works Notice.

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  3. Feb 14, 2023 · Mask Works are a type of intellectual property created by the Semiconductor Chip Protection Act (SCPA) of 1984. Statutory Mask Works rights are set forth in Title 17 United States Code §§ 901-914. In general, the SCPA allows for the protection of the combination of a mask and a semiconductor chip.

  4. Jul 6, 2023 · A mask work refers to the pattern or arrangement of electronic circuitry that is used to manufacture an integrated circuit. It is created through a process called photolithography, where a pattern is transferred onto a silicon wafer using a series of masks.

  5. Feb 28, 2022 · Mask works are collections of templates (photographic masks) used to create complex electronic circuits on semiconductor chips. The SCPA protects the mask works themselves as well as semiconductor chips in which the mask works are imprinted.

  6. in a semiconductor chip product. A mask work is “fixed” in a semiconductor chip product “when its embodiment in the product is sufficiently permanent or stable to permit the mask work to be perceived or reproduced from the product for a period of more than transitory duration.” 17 U.S.C. § 901(a)(3).

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  7. Subchapter A—Copyright Office and Procedures;Part 211--Mask Work Protection. Section. Title. 211.1. General provisions. 211.2. Recordation of documents pertaining to mask works. 211.3. Mask work fees.

  8. Mask Work. Photographic templates (masks) used to imprint three-dimensional images or patterns on layers of material in manufacturing semiconductor chips.

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